[mems-talk] how to get rid of photoresist residure

[Chin-Jen Chiang]

Hi Bill,
   
  Thanks for your response. 
   
  My device has very sharp Si field emitter tips with ~150A radius. Using RIE descum with O2 gas might damage the Si tips due to ion or radical bombardment. Do you have any comment about this?
  Thanks.
   
  Lawrence
   

Bill Moffat <BMoffat at yieldengineering.com> &#187;&#161;&#161;G
  What is your device concern? Modern plasma cleaners have electron free
plasma that can safely and gently etch organics with no ESD and minimal
change if temperature.