[mems-talk] PR residue after CF4 RIE

basar bolukbas basarbolukbas at hotmail.com
Tue Jul 1 15:19:03 EDT 2008


Piranha Solution (H2SO4:H2O2/3:1) eats any organic based patterns on your sample. (resist residue, dielectric layer, polyimide etc...)

You can use this solution for residues but in order to protect other patterns from possible attacks, you should try on dummies first.  


More information about the MEMS-talk mailing list