[mems-talk] Info about ITO sputtering

[Rafael Garc=?US-ASCII?Q?=ED?=a Valverde]

Hi all,

I'm trying to work out the energy and argon consumption in the ITO DC
sputtering process. I know that ITO target are usually deposited into a
glass substrate using DC sputtering. In the MEMS web site
(http://www.mems-exchange.org/catalog/P1827/) I have found very
interesting information about the process. However I would like to
confirm the power consumption in the process (only microwave power is
mentioned, nothing about vaccumm pumps or the whole process) and the
argon consumption.

Any information about it will be welcomed.

Many thanks,

Rafael García Valverde

Becario de Investigación / Ph.D.student
Departamento de Electrónica, Tecnología de Computadoras
y Proyectos /
Electronics, Computer Tecnology and Projects Department

UNIVERSIDAD POLITÉCNICA DE CARTAGENA.
Campus Muralla del Mar. C/Doctor Fleming s/n, 30202
Cartagena. Spain

email: rafael.gvalverde at upct.es
Tf: 34-968-398787
Fax:0034-968-325400