[mems-talk] PR removal after ICP RIE etching

Andrew Sarangan asarangan at gmail.com
Tue May 20 10:05:09 EDT 2008


What type of photoresist?

On Mon, May 19, 2008 at 11:00 PM, Satish Yeldandi
<sathish.yeldandi at gmail.com> wrote:
> Hi!
>
> I have problem removing photo resist after using it as mask for
> ICP-RIE etching. I tried Acetone, Acetone+Sonication, PR stripper,
> Asher. Nothing is working. Did anyone face this problem before. 


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