[mems-talk] PR removal after ICP RIE etching

[Oakes Garrett]

In my past I have used a soda ash (yes, high purity Arm & Hammer)
stripper followed by high pressure surfactant cleaning and brush
cleaning of the wafer surface.

Have you tried solid-CO2 (snow cleaning)?  Of course, this assumes your
strucures can withstand solid abrasives.

Best Regards,
Garrett Oakes


-----Original Message-----
From: Satish Yeldandi [mailto:sathish.yeldandi at gmail.com] 
Sent: Monday, May 19, 2008 8:01 PM
To: General MEMS discussion
Subject: [mems-talk] PR removal after ICP RIE etching

Hi!

I have problem removing photo resist after using it as mask for
ICP-RIE etching. I tried Acetone, Acetone+Sonication, PR stripper,
Asher. Nothing is working. Did anyone face this problem before. If
anyone has any solution for this problem please tell me.

Thanks
Satish