[mems-talk] Cleaning surfaces particle free

[Joseph Grogan]

Hello Pavan,

I haven't worked with that resist or stripper, but to start I'd try 
using multiple stripper baths. Strip the bulk of the resist in a first 
bath (dirty bath), then move the wafers to a fresh bath of stripper 
(clean bath) to get any residual junk off. If that doesn't make things 
better, I suggest something warm and bubbly with hydrogen peroxide in 
it, either SC-1/RCA-1 or piranha. Try SC-1/RCA-1 first, it's safer to 
work with than piranha (but still requires standard chemical safety 
precautions).

-Joe Grogan

Pavan Samudrala wrote:
> Hello all,
>
> I am stripping AZ resists in AZ400T stripper (immersion based stripping).
> After stripping, I see small particles of resist lying on the wafer. Does
> anyone have a good method of stripping the wafers or cleaning the stripped
> wafers to make it particle free.
>
> The environment I work is not a clean room and will not be particle free.
> But I am trying to reduce the particles on the wafers as much as humanly
> possible.
>
> Regards,
>
> Pavan Samudrala

-- 
Joseph Grogan
Graduate Student
Department of Mechanical Engineering & Applied Mechanics
University of Pennsylvania
220 South 33rd st
Room 229, Towne Building
Philadelphia PA, 19104
Lab Phone: 215-898-1380