[mems-talk] Cleaning optical masks

[Mike Whitson]

Also, if you happen to have access to a suitable oxygen RIE tool, that can be a much more aggressive clean of thick organics like SU-8 than a barrel asher.  (Many DRIE tools have an O2 cycle available for the purpose of stripping the DRIE passivation layer and/or chamber cleaning.)  But still beware of sputtering of the Cr by doing plasma cleans too often.


On Mar 26, 2010, at 10:04, Andrew Irvine wrote:

> Just to re-visit a wise warning from a recent poster, Piranha etch (at 110C or not) is seriously hazardous, and we need to be flagging up safety advice when suggesting stuff.
> 
> I don't see a problem with using an oxygen asher, and if there is no problem (anyone?), do that instead, Mikas!
> 
> Andy