Hi Madhu I use 10:1 BOE (Buffered Oxide etch) to etch Titanium, the etch rate for sputtered Ti is 11kA/min. I use evaporated Ti & my etch rate is roughly half of that. I do not have information for Fe & Nickel, but since 10:1 BOE is fairly commonly available in most labs you might want to determine the etch rates. Overall 10:1 BOE gives me good & uniform results for Ti etching Good Luck Anupama > I am looking for an etch for Titanium that does not affect > the following: > > 1:Nickel > 2:Iron > > Any help in this regard would be greatly appreciated. > > Thanks in advance! > > Madhu > LSU > > > > Need a new email address that people can remember > Check out the new EudoraMail at > http://www.eudoramail.com > > _______________________________________________ > MEMS-talk@memsnet.org mailing list: to unsubscribe or > change your list options, visit > http://mail.mems-exchange.org/mailman/listinfo/mems-talk > Hosted by the MEMS Exchange, providers of MEMS processing > services. Visit us at http://www.memsnet.org/ Anupama V. Govindarajan Graduate Student - EE MEMS laboratory Department of Electrical Engineering University of Washington Campus Box 352500, Seattle WA 98195 Phone: (206)-221-5340 email: anupama@ee.washington.edu