If you want such an accuracy over a large area, angle alignment will be very critical. I used to prefer low magnification for angle alignment since depth of field (hence seperation) is not a problem, but for this you need good contrast (e.g metal, not a shallow recess etch). I used to place large L patterns (20-50um wide, 300-500um long legs) on corners of my dies, then align angle at low magnification and check the alignment at high magnification. Unfortunately I do not have any alignment marks handy from those days.. If you have a good angle alignment verniers or crosses will give you pretty decent alignment, 1um was not a great deal, 0.5 um was attainable for samples w/ edge beads removed. Good luck Erhan Ata -----Original Message----- From: Glen Landry [mailto:landry@anvil.nrl.navy.mil] Sent: Wednesday, May 28, 2003 6:10 AM To: mems-talk@memsnet.org Subject: [mems-talk] Photolithography alignment marks I am looking for other people's ideas for alignment marks. I am using a Karl Suss MJB3 aligner and I want at least 0.5 micron accuracy. The marks I am using consist of a ~100micron feature for rough alignment, and then a vernier. The vernier consists of five rectangles, 2 microns wide, and separated by 5 microns. The rectangles on the second mask are separated by 5.5 microns in such a way that when alignment is correct, the center rectangles align. When alignment is 0.5micron off, the rectangle one from center is aligned. It looks like this (excuse the crude drawing): O O O O O base vernier O O O O O top vernier (aligned) These marks can get me to better than 0.5micron, but I have to almost be in vacuum contact before I can see my alignment clearly. I have thought of better alignment marks, but at $600/mask I want to get it right the first time. I am wondering if it would work better if the top marks were larger/smaller than the bottom marks (I am using a dark field mask) or if I would still be able to get as good of an alignment if my marks were say 5microns wide so I could see through them without being in very close contact. If anyone has a CAD/PDF design of marks that work for them, please e-mail me. Thanks. Glen Landry