durusmail: mems-talk: RE: Patterning elastomeric materials
RE: Patterning elastomeric materials
RE: Patterning elastomeric materials
Michael Pedersen
1997-09-23
Hi Adam,

I would suggest that you look into the use of polyimide. Polyimide is a =
very stable polymer with a modulus of 3 to 10 GPa. Photosensitive =
polyimides which can be spin coated and patterned like normal =
photoresist are available from suppliers like DuPont, Hitachi and =
Ciba-Geigy. These materials can easily be patterned with a line =
thickness less than 15 microns, depending on the desired layer =
thickness.

Michael Pedersen

MESA Research Institute/The Netherlands


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