Thomas, Try switching at least your soft bake to a hot-plate. Microchem wrote all of its specs with hotplates in mind, so in an oven you may not be baking of all of the solvent, or more likely given your symptoms, you are baking off the top layer of solvent and trapping the rest in lower layers which dissolve in the develop. Since a hot plate heats from the bottom, this is less likely to happen. Greg Reimann Boston University -----Original Message----- From: mems-talk-bounces+gjreiman=bu.edu@memsnet.org [mailto:mems-talk-bounces+gjreiman=bu.edu@memsnet.org] On Behalf Of Thomas KF Lei Sent: Wednesday, July 02, 2003 8:16 AM To: mems-talk@memsnet.org Subject: [mems-talk] SU-8 problem Dear collegues, I have some problems in doing MicroChem SU-8 2075 PR on Si. My process is: spin 500rpm and 3000rpm 30secs soft bake: 95C 15mins in oven UV explore with filter WB-360: 300secs PEB: 95C 10mins in oven Develop: about 10mins I found that the surface of SU-8 becomes wrinkling after PEB and my pattern peer off after develop. Can anyone give me some suggestions? Thank you very much. Thomas _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/