durusmail: mems-talk: Mask Clean
Mask Clean
2003-07-31
2003-07-31
2003-08-04
2003-08-01
Silicic acid for TMAH etch
2003-08-03
Mask Clean
BobHendu@aol.com
2003-08-01
Cleaning a chrome mask in Sulfuric/peroxide is a very effective way to remove
photoresist and other organic particles. Be careful when preparing the solution
as it is exothermic and will heat to 120 degrees C quickly. You might want to
allow it to cool before using as the shock at that temperature can break the
glass. Same with removing it from solution. Have a heated beaker of di water to
transfer the mask to before placing in your normal di water dump rinser. Bob
Henderson

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