Hi,


     Why dont you try with Buffered Hydroflouric acid? It is most easier way to
do and you may require Cr/Au mask to do so. You can realize the required pattern
by well-known lift-off technique.


cheers,


Ramakrishna. T.

"General MEMS discussion" wrote:



Hi all,

I tried glass etching at room temperature with 25% fluorosilicic acid using
photoresist as a mask. But to my surprise it is not etching the glass even
after an hour. The glass I used was pyrex 7740.

If any of you have successfully etched glass with fluorosilicic acid, please
suggest me the exact recipe.

Thanking you all in anticipation,

Keyur Shah


Keyur Shah
PhD student, CBME Department
Stevens Institute of Technology
Castle Point on Hudson, Hoboken, NJ 07030.
Web address : http://attila.stevens-tech.edu/~kshah5

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