ISI MEMS Electronic Discussion Group members,

I am working on wafer-through etching of Si substrate
using KOH. I am wondering if there is a method of
achieving smooth(mirror-like)111 surface. And does anyone
know about regulating SiO2 mask etching rate in KOH?
I would appreciate it very much if you could refer
books or published materials regarding the above subject.
Thanks in advance.


Best regards,

Regan Nayve
Fuji Xerox, NMD Dept.
e-mail (business): regan@nmd.ebina.fujixerox.co.jp