Hi, Temperature... I would not be surprised that temperature variation of the reactor would explain the different roughness observed for the first and second samples. Temperature may have an effect on the sidewall profile, thus also on the grass. Re-entrant profiles help to avoid grass. So I suggest to pre-heat your chamber by using Ar or O2 plasmas (I assume that your RIE system is at room temperature without much temperature control). You could also try to modify the O2/CHF3 ratios if not tried yet. Good Luck, Boris Lamontagne National Research Council, Canada -----Original Message----- From: Jiaping Yue [mailto:ping@virginia.edu] Sent: Wednesday, October 08, 2003 3:34 PM To: mems-talk@memsnet.org Subject: [mems-talk] problems with RIE grass Hi All, We had very serious problems with RIE grass when we were etching chips. In the chip, we used Al as mask for 7um SiO2 anisotropic RIE etch (CHF3 and O2) and we tried to put the chip on steel plate, Si wafer or quartz to avoid the RIE grass. But there is not much difference. And we found that if we etch 2 chips in sequence, then the first chip etched has much grass, but the second one is very clean. Recently, there was leak in the RIE system and we fixed it, but etching chips in sequence to avoid grass doesn't work and the result seems much worse than before. Does anyone have any idea about why we can get a better result for the 2nd chip (all the parameters are same) and why it doesn't work after fixing the machine? Also if we just etch 1 chip, sometimes it has lots of grass, but sometimes it has less grass and is acceptable (open area without Al mask has more grass than small gaps). The result is not stable, and varies without reason. Does anyone have idea about this? Cleaning the system doesn’t seem to help much. Last, because the system is not reliable and produces grass without forewarning, is there any kind of method that can tell if the RIE system is good to run? I mean, is there a method that can test if we will get grass in the etched chip before we etch it except using our chips for the test every time, because the number of chips is limited and we don't want to waste them. And do you have any good idea about avoiding the RIE grass? Thanks a lot for your help. Jiaping _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/