At 11:42 AM 11/11/97 +0900, you wrote:
>ISI MEMS Electronic Discussion Group members,
>
>I am working on wafer-through etching of Si substrate
>using KOH. I am wondering if there is a method of
>achieving smooth(mirror-like)111 surface. And does anyone
>know about regulating SiO2 mask etching rate in KOH?
>I would appreciate it very much if you could refer
>books or published materials regarding the above subject.
>Thanks in advance.
>
>
>Best regards,
>
>Regan Nayve
>Fuji Xerox, NMD Dept.
>e-mail (business): regan@nmd.ebina.fujixerox.co.jp

Dear Regan,

I've been working on this issue for some time now. There's an elaborate
article on this topic by T.Kwa et al. (J.Electrochem.Soc.142(4), Apr 1995,
pp. 1226-1233).
For more information you can also take a look at my website. You might be
interested in the following article, which is not on the publication list yet:
J.van der Linden et al., "Micromachined Photodetector Submount for In-Line
Monitoring of Planar Polymer Waveguide Circuits", Micro-Optics Conference
and Topical Meeting on Gradient-Index Optical Systems, Tokyo, Oct 1997, pp.
11-14).

Kind regards,

Johan.
_______________________________________

Ir.Ing. Johan E. van der Linden

University of Gent (Belgium)
Department of Information Technology (INTEC)
St-Pietersnieuwstraat 41                B-9000 Gent
Tel +32 9 264 33 16        Fax +32 9 264 35 93

e-mail: johan.vanderlinden@intec.rug.ac.be
homepage: http://intec.rug.ac.be/www/u/143
_______________________________________