If you are interested in dry etch, then using SF6 at low pressure and
moderate power is the way to go.

Mubeen Almoustafa
Process Engineer
Trion Technology

-----Original Message-----
From: mems-talk-bounces+mubeen=triontech.com@memsnet.org
[mailto:mems-talk-bounces+mubeen=triontech.com@memsnet.org]On Behalf Of Kirt
& Erika Zipf-Williams
Sent: Friday, October 17, 2003 11:07 AM
To: General MEMS discussion
Subject: Re: [mems-talk] Q: Ti wet etching

> I would like to ask you about the recipe of Ti etchant.  We are going to
> etch a <50 nm thick Ti layer on epitaxial barium titanate.  Since this
> material must be unfamiliar with you, you don't forget about it.  I just
> want to know what kinds of etchant you usually fix for Ti etching.
> Thanks a lot in advance.
> T. Sophie Hamano

You can use 10 H2O : 1 H2O2 (30%) : 1 HF (49%).
My measured etch rate for sputtered titanium is 1.1 um/min = 1100 nm/min.

    --Kirt Williams, Ph.D.    consultant


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