Dear Parasa, As far as I know : NH4OH , Citric Acid, and Succinic Acid based solutions should(?) work. Below references are mostly about GaAs on Al(x)Ga(1-x)As, but I guess it helps. References : R.P. Ribas, Materials Science and Engineering B51 1998 p.267 K. Hjort, J.Micromech. Microeng. , 6(1996), p. 370 Eun-A Moon et. al. JAP, vol. 84 no.7 1998, p. 3933 Good luck, Oray Orkun Cellek Research Assistant, Ph. D. Student Electrical & Electronics Engineering Department Middle East Technical University 06531 Ankara Turkey Tel : +90 312 210 4579 Fax : +90 312 210 1261 e-mail : o.o.cellek@ieee.org ----- Original Message ----- From: "Sai Raghav Parasa"To: Sent: Friday, December 12, 2003 2:58 AM Subject: [mems-talk] High Selectivity for GaAs over AlAs for Wet ChemicalEtching > Hi all, > > Can you give 3 best etchants which have high selectivity for GaAs over AlAs for Wet Chemical Etching? > > The etchant should best etch GaAs but should not attack AlAs. > > Thanks, > Bye, > Parasa, > University of Kassel, Germany. > > > --------------------------------- > Do you Yahoo!? > New Yahoo! Photos - easier uploading and sharing > _______________________________________________ > MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list > options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk > Hosted by the MEMS Exchange, providers of MEMS processing services. > Visit us at http://www.memsnet.org/