Does anyone know if there is anyway to apply photoresist (e.g., spray)
other than spining? We are currently thinking about how to apply PR
uniformly on a Si wafer which has some 3-D microstructures.

Thanks.

Robin

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Robin Hui Liu
RM B428c, The Beckman Institute,           | Tel: (217)-333-0188 (o)
University of Illinois, Urbana/Champaign  |      (217)-359-0051 (H)/fax
405 N.Mathews Ave.                                | Fax: (217)-244-0105
Urbana, IL 61801                                     |
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Email: robinl@brain.beckman.uiuc.edu