I'm looking for a photoresist that does not have a TMAH based developer and
would be suitable for lift-off process.
Whether the resist is positive or negative doesn't really matter - it needs to
be baked below 160 C.  I have UV capablities from 405 nm -254nm.
The device, I'm working on, has a layer that is being attacked by the TMAH based
developers.

Thanks,

Greg Miller
KVH Industries
8412 W 185th Street
Tinley Park, IL 60477
Email: gmiller@kvh.com