MEMS community,

I am starting to work with PZT thin films (solgel and pulsed laser
deposited), which I plan to etch using diluted (10:1) BOE solution.
It was recommended to me by one source that after etching the PZT I
should perform a brief (5 min) dip in heated (50C) concentrated
HCl to removed metal fluorides created during the PZT etching.

Can anyone with experience working with PZT thin films comment on the
necessity and utility of the HCl dip?  Is this something that you have
done?  What are the effects of this step?

Many thanks,

Robert White
University of Michigan, Ann Arbor
rdwhite@umich.edu