hello all
pls any one suggest me the post bake temperature before HF etching photoresist
i used SR 1813.
regards
rajan malik


Quoting Jason Viotty :

> If your devices are not fragile, you could try doing an ultrasonic
> cleaning
> in Acetone. We often use this method to remove toughened resist.
>
> ___________________________________________________________
> Jason Viotty
> Senior Process Engineer
> C2V
> http://www.c2v.nl
> ___________________________________________________________
>
>
> -----Original Message-----
> From: Nadav Agian [mailto:Nadav.Agian@remonmedical.com]
> Sent: dinsdag 30 december 2003 12:38
> To: mems-talk@memsnet.org
> Subject: [mems-talk] AZ5214 remover
>
>
> I am using an AZ5214 P.R as a protective coating for dicing .
> I tried to remove the coating with Acetone , but I still have some
> residuals
> around the Al lines.
> Is there a better way to remove those marks ?
>
>
> Nadav
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>
> _______________________________________________
> MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
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> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/
>



Rajan Malik
Graduate Student
Electrical Engg.
University of south Florida