Hello All

I am looking for a recipie that will allow me to deposit
PECVD nitride or oxide on high aspect ratio structures at
low temperatures say around 250 degC. The main reason is to
prevent a polyimide layer on the wafer from degasing when
the oxidation / nitridation is done at higher temperatures
like 350deg C.

Please let me know if anyone can point me to such a recipie.
Any help in this regard will be much appreciated

Looking forward to your replies

Sincerely
Anupama

Anupama V. Govindarajan
Graduate Student - EE MEMS laboratory
Department of Electrical Engineering
University of Washington
Campus Box 352500, Seattle WA 98195
Phone: (206)-221-5340
email: anupama@ee.washington.edu