Dear MEMS-talk members,

Currently iam working on the process for getting a 100um thick
SU8 film. I am using SU8- 2075 resist for my experiments. I am processing all
my samples as per the data sheet provided by microchem.

The problem i am facing are:

1. When i exposed and developed the samples the structures at the edge got
developed quickly, but the structures at the center are not completely
developed.

I played with different exposure time and develope time on different
samples,but still i am having the same problem.

2. The samples after soft bake has a wavery pattern. Can you suggest any
process technique for eliminating those wave pattern on the sample.

3. Currently i am using box furnace for baking. Is it ok.


We thought 2075 has more viscosity so we switched to 2050 which is less
viscous than 2075. The final objective of my experiment is to get a 100 um SU8
film & get a sharp structures for my further process.

Can you suggest me regarding this.

Thanks..

Raviprakash

Research assistant,
AMPAC,
University of Central Florida,
Orlando, Fl-32826.
Ph: Lab: (407)823-4517
Home: (407)380-7161