I'm unsure what you mean by "two photoresists".  We have successfully used
AZ1512 for overhangs, using a 20 min chlorobenzene soak, after exposure.

contact Hoechst for details They may have changed the name/improved the
product, since I last did it 2 years ago)

Shekhar bhansali


>Does anyone know how to make an overhanging using two photoresists to =
>realize a lift-off.
>Could you please inform me on the followings :
>* Photoresists, manufacturer
>* exposure time, wavelength
>* remover
>* and so on
>
>Thanks
>
>Philippe HELIN
>IEMN
>Avenue Poincar=E9, BP 69
>59652 Villeneuve d'Ascq, FRANCE
>fax : 333 20 19 78 78
>Email : helin@iemn.univ-lille1.fr
>
>

Shekhar Bhansali
STA Visiting Fellow
National Research Laboratory of Metrology
1-1-4 Umezono
Tsukuba, Ibaraki 305 JAPAN
Phone +81 298 54 4052       Fax:  =81 298 54 4135