In our institute we have made some experiments with a new negative tone pho=
to =

resists which can be developed with conventional alkaline developers (as us=
ed for =

positive tone photo resists). The dimensions of the undercut can be control=
led by =

the development time. =


In a recent published paper   =84New negative-tone photo resists avoid swel=
ling and =

distortion" published in Solid State Technology January 1997 you may find f=
urther =

informations.

Address of the resist supplier: MicroResist Technology, Slabystrasse  7a, D=
-12459 =

Berlin , Germany

phone: +49 30 635 0798,  fax: +49 30 635 0991, e-mail: =

gruetzner@berlin.isit.fhg.de





H.J. Quenzer
Fraunhofer Institute for Silion Technology
Fraunhoferstrasse 1
D-25524 Itzehoe
Germany
Phone +49 4821 17 4524, Fax +49 4821 17 4251