Dear MEMS experts,

I am searching for some type of organic coating that can be spun on or
brushed on that is insoluble in TMAH at 85°C.  Possibly something that
is somewhat similar to a photoresist that can also be removed easily
after the TMAH etch has been completed.  I am seeking to use this as a
protective mask as opposed to using an oxide mask.  Any suggestions that
you can provide would be greatly appreciated.



Preston Larson
Graduate Research Assistant
University of Oklahoma
Dept. of Physics and Astronomy
440 W. Brooks Street
Norman, OK 73019