Ariel,

What I have seen is that "Line Edge Roughness" (I've also seen it referred to as
"mouse bites") can be affected by the soft bake parameters used to cure the
resist film.  In my experience, I have more often seen this effect in cases
where the soft bake was a little on the low side, indicating residual solvent in
the film. As such, the solution I have seen for the problem was to increase the
time (or the temperature) of the softbake, or else to perform a second bake step
in an external oven.


Best Regards,

Chad Brubaker

EV Group       invent * innovate * implement
Technology - Tel: (602) 437-9492, Fax: (602)437-9435 e-mail:
C.Brubaker@EVGroup.com, www.EVGroup.com

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 -----Original Message-----
From:   mems-talk-bounces+c.brubaker=evgroup.com@memsnet.org [mailto:mems-talk-
bounces+c.brubaker=evgroup.com@memsnet.org]  On Behalf Of Ariel Lipson (IC)
Sent:   Monday, February 09, 2004 9:36 AM
To:     MEMS-talk@memsnet.org
Subject:        [mems-talk] Line Edge Roughness

Hello,

    I'm trying to fabricate ~2um features in silicon using Shipley S1805
photoresist, but get rough resist edges (<0.5um). This problem is know as
"Line Edge Roughness". Does anyone have any suggestion how to reduce the effect.

Thanks, Ariel
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