I would like to know if there is a good method of coating a hydrophobic
(teflon-like) polymer surface with a thin layer (max few nm) of, e.g.,
monomer to make the surface hydrophilic and solvent-resistant for
subsequent lithographic processing.  Currently we are using
plasma-coating which works fine but spin-coating from a liquid solution
would be much more convenient.

Thanks

Kristjan Leosson
kl@mmphotons.dk