Hi Lu,

we use a mixture of 2Vol% HF (40%) and 2Vol% HNO3 for 100nm films.

Antje

SLU schrieb:

> Hello, everybody,
>
> We're going to etch 500nm and 1um thick Ti film. It takes some time to buy
> the pre-mixed etchant, so we are looking for some alternative acid etchant
> that may be available in our lab, such as nitrid acid, or sulfric acid.
> We'd
> appreciate if  anybody can share such recipe with us.
>
> lu
>
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