For details of a pressure-sensor fabrication process, including etching the diaphragm in KOH, see the book "An Introduction to Microelectromechanical Systems Engineering" by Nadim Maluf. The second edition is due out in June. ----- Original Message ----- From: "harish pisipati"To: Sent: Monday, March 15, 2004 8:11 AM Subject: [mems-talk] Back Etching of Si wafer with KOH > Hi, > I am trying to etch the backside of a n-silicon > wafer. The back side of the wafer is not polished. > Please let me know if the backside needs to be > polished for a faster etch or it doesn't matter. I > learnt from a previous email of the group as how to > protect the front side during a long KOH etch of the > back side. The etchant I planning to use is 50% by > weight KOH solution at 70C. Also please let me know if > you have any suggestions for me during this process. > My target device is a thin diaphragm for a pressure > sensor. If you can please give me any web links that > go through the fab details of a pressure sensor. > > Thank you very much. > > Find local movie times and trailers on Yahoo! Movies. > http://au.movies.yahoo.com > > _______________________________________________ > MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list > options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk > Hosted by the MEMS Exchange, providers of MEMS processing services. > Visit us at http://www.memsnet.org/