Yes, I've etched 7740 Pyrex by RIE.  I suspect etching will eventually
stop unless there is enough energetic ion activity to sputter the stuff
away.  A good reference is a paper by Xinghua Li et al, Deep reactive
ion etching of Pyrex glass using SF6 plasma, Sensors and Actuators A 87
(2001) 139-145.

Roger Shile

-----Original Message-----
From: mems-talk-bounces+rshile=nanoink.net@memsnet.org
[mailto:mems-talk-bounces+rshile=nanoink.net@memsnet.org] On Behalf Of
Kirt Williams
Sent: Monday, March 15, 2004 10:13 AM
To: General MEMS discussion
Subject: Re: [mems-talk] Anisotropic etching in Pyrex glass

Is that Pyrex 7740?
What happens to the non-volatile reaction products like AlF3?
Are they sputtered off?
    --Kirt Williams

----- Original Message -----
From: "Shile" 
To: ; "'General MEMS discussion'"

Sent: Monday, March 15, 2004 9:24 AM
Subject: RE: [mems-talk] Anisotropic etching in Pyrex glass


> For anisotropic Pyrex etch use SF6 RIE. It's a bit slow, but ~5
microns
> is easy to achieve in a capacitivly coupled etcher using a metal mask.
> Etching Pyrex to a depth of several hundred microns has been achieved
> with ICP systems.
>
> Roger Shile


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