Hi,


I need to do SF6 isotropic dry etch of single crystal Si. I was wondering if
Silicon Nitride and Silicon Dioxide will also be etched in this process. If
so, does SF6 has good selectivity to them? I heard that people can use
Silicon Nitride or Silicon Dioxide as mask in BOSCH process (DRIE). So I
guess SF6 does have good selectivity to them. But I am not sure. Please let
me know if you have any information about this. Thanks!


Best Regards,


Qing Yao
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M&IE @ UIUC