Yao,

The Si02 and Si3N4 will etch much, much, slower than the Si in SF6, but uit will
etch them all.

Brent

Qing Yao wrote:

> Hi,
>
> I need to do SF6 isotropic dry etch of single crystal Si. I was wondering if
> Silicon Nitride and Silicon Dioxide will also be etched in this process. If
> so, does SF6 has good selectivity to them? I heard that people can use
> Silicon Nitride or Silicon Dioxide as mask in BOSCH process (DRIE). So I
> guess SF6 does have good selectivity to them. But I am not sure. Please let
> me know if you have any information about this. Thanks!
>
> Best Regards,
>
> Qing Yao
> ___________________
> M&IE @ UIUC
>
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