Dear all,

I want to use the KOH etched {111}-planes as mirrors. In a first
experiment I used a KOH solution with following properties:
concentration: 30% KOH by weight
temperature: 85°C
magnetic stirring

The result: the roughness of the mirror planes is with about 150 nm rms
extremely high (messured with zygo white light interferometer).
I have read about the use of IPA to change the wetting properties of the
solution. (less gas bubbles adhesion on the etched surfaces)
So knows anybody the right formula for KOH-etching to achieve smooth
{111}-planes?

Kind regards,
                        Armin Werber






Institute of Microsystem Technology
University of Freiburg
Georges-Köhler-Allee 102
79110 Freiburg

Tel.: +49 761 203 7518
Fax.: +49 761 203 7562

  werber@imtek.uni-freiburg.de
 
www.imtek.uni-freiburg.de/micro-optics