Hi,

I am a beginner in the RIE field and I would like to know some basic
information for start

I need to make a square matrix of SIO2 pilars with roughly the following
dimensions (1 micron height, 100x100 nm) and the pilars need to be spaced
by ~400 nm.    My idea is to do e-beam litography (with PMMA)and then form
a "protective" mask of a metal (e.g.: Ni or Cr).
I would like to know roughly the process conditions (i.e. gases, pressure,
power) for RIE...
My starting my material is a 1 micron thick SiO2 on Si

Any reference to any material in the web would also be highly apreciable...

Thanks

Andre