Hi all:
I encountered a problem while doing RIE polyimide (85%O2+15%CF4) to expose
the underlying Al metallization. It was found that some residues were
generated on top of the exposed Al after RIE etching. Does anybody know what
chemicals can be used to remove these residues without attacking the exposed
Al metal. Thank you very much.

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Honggang Jiang
Materials Science Engineer
Second Sight
12744 San Fernando Road
Building 3
Sylmar, CA  91342
Ph: 818 833 5058
Fx: 818 833 5067
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