Hi,


I plan to use HF (or buffered HF) to do a very small amount of isotropic
etch of single crystal Silicon to remove the surface roughness after DRIE
(BOSCH process). Does anybody have a recipe (solution formula, etch rate...)
for that? Also, please let me know if there are other methods which can be
used to make the surface smoother. Thanks!



Best Regards,


Qing Yao
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M&IE @ UIUC