Hi everybody,

I want to create a silicon micromembrane. I`m using a
~1 micron thermal SiO2 as a masking layer for KOH
etching.
There is a problem that I can`t overcome, when I want
to etch SiO2 to create windows, HF removes photoresist
layer before creating the layout.
I will be thankful if anybody can help me.

Mahdi Bagheri




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