Mahdi,
       Are you using buffered H.F. and are you using vacuum vapor prime.  Bill
Moffat

-----Original Message-----
From: mahdi bagheri [mailto:mahdimech@yahoo.com]
Sent: Thursday, June 03, 2004 11:32 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] SiO2 Etching Problem


Hi everybody,

I want to create a silicon micromembrane. I`m using a
~1 micron thermal SiO2 as a masking layer for KOH
etching.
There is a problem that I can`t overcome, when I want
to etch SiO2 to create windows, HF removes photoresist
layer before creating the layout.
I will be thankful if anybody can help me.

Mahdi Bagheri




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