Hello,

You may have trouble, as HF etches Alumina, so you are getting undercut of
your film, no matter what the metal is that you try to use.

Also, if you are depositing Chromium onto Alumina using a liftoff process,
you are probably using evaporation with no sputter etch of the substrate;
adhesion for that approach usually will be less than sputter-deposition
preceded by a sputter etch insitu.

You might try the sputter deposition with a pre-etch using Chromium and then
photo followed by an Ion Beam Etch, and resist strip.  But your metal
pattern will still be undercut by HF if it is sitting on top of Al2O3.

- Justin

Justin C. Borski
MEMS Program Manager
Advanced MicroSensors Inc.
jborski@advancedmicrosensors.com





-----Original Message-----
From: Tripp, Marie Kathleen [mailto:marie.tripp@micro.mavt.ethz.ch]
Sent: Tuesday, June 08, 2004 12:41 PM
To: General MEMS discussion
Subject: [mems-talk] Metal Question


Hi Everyone,  I was wondering if someone could suggest a metal which will
adhere to Alumina and can be patterned with liftoff and will survive (at
least for a while) in HF?  I tried Chromium but was unsuccessful.  I
throught that I'd ask before I tried too many other metals.

Thanks,
Marie

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