Hi,

        Can you deposit PECVD nitride or sputter Cr layer as a hard mask
on your polymer? If your patterns are large, can even a shadow mask do the
job?

Isaac

On Fri, 11 Jun 2004, Hengcw wrote:

> Hi,
>
> I want to etching a polymer layer using RIE, and the mask patent of the
> polymer layer is negative photoresist. Because this both layer is polymer
> material. If i use gas O2 to etching the polymer, it also will etch the
> photoresist.
>
> Does any body have this experience, what is the gas and parameter of RIE
> you using.
>
> Please advise. Thanks.
>
> Regards,
> Heng
>
>
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Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 888-4567, ext. 6014
Fax: (519) 746-6321
iwchan@venus.uwaterloo.ca
http://www.ece.uwaterloo.ca/~a-sidic