I think KOH has relatively poor selectivity between SiO2 and Silicon.
You might consider switching to EDP (ethylene diamine pyrochatachol).

-Mike


>>> mahdimech@yahoo.com 6/14/2004 10:33:45 AM >>>
Hello,

I want to etch silicon using SiO2 mask. At the
temperature of 85 (C), after 75 minutes, KOH attacks
to the SiO2 mask. The etchant solution is water: 80
cc, Isopropyl alcohol: 20 cc, koh: 30 gr. What can I
do to etch silicon?

Regards,
Mahdi Bagheri




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