I have a question  regarding the SiO2 etching which I am planning to use as
the mask.
    I want to use BOE as the etchant.Does any one have any particular idea
about the etch rate of SiO2 in BOE ( what would be the concentration
profile). and
   what conatiner can i use for etching of Silicon using KOH.
I would really appriciate if any one go a head and answer to these
questions.

Thanks,
Dhanamjaya Reddy Guda
Louisiana State University,
Department of Mechanical Engineering
Ph.No: 225-578-4412