A quick search at Engineering Village turned up the following
suggestions:
Dry etching of platinum films with TiN masks in an Ar/O2
helicon wave plasma
Chiang, Ming-Chung (Natl Nano Device Lab); Pan, Fu-Ming;
Cheng, Han-Chung; Liu, Jeng-Shu; Chan, Shih-Hsiung; Wei, Ta-
Chin Source: Journal of Vacuum Science and Technology, Part
A: Vacuum, Surfaces and Films, v 18, n 1, Jan, 2000, p 181-
187
Platinum etching using a TiO2 hard mask in an O2/Cl2/Ar plasma
Chung, Chee Won (Samsung Advanced Inst of Technology); Chung,
Ilsub Source: Journal of Vacuum Science and Technology, Part
A: Vacuum, Surfaces and Films, v 18, n 3, May, 2000, p 835-839
Etching of platinum thin films by high density Ar/Cl2/HBr
plasma
Kim, C.-I. (Chungang Univ); Kim, N.-H.; Chang, E.-G.; Kwon,
K.-H.; Yeom, G.-Y.; Seo, Y.-J. Source: Materials Research
Society Symposium - Proceedings, v 514, Advanced
Interconnects and Contact Materials and Processes for Future
Integrated Circuits, 1998, p 357-362
Study on fence-free platinum etching using chlorine-based
gases in inductively coupled plasma
Chung, Chee Won (Samsung Advanced Inst of Technology); Song,
Ho Gun Source: Journal of the Electrochemical Society, v 144,
n 11, Nov, 1997, p L294-L296
Database: Compendex
---- Original message ----
>Date: Tue, 22 Jun 2004 09:24:19 -0400
>From: "Wizards Handicapping"
>Subject: [mems-talk] Dry Etch of Platinum
>To:
>
> Hi:
>
>
>
> Does anyone know of a parallel plate RIE method for
> etching platinum, along with some potential masking
> layers? It can be F or Cl based. I haven't been
> able to find much information on it, if anyone has a
> reference or some suggestions it would be much
> appreciated.
>
>
>
> Thanks
>
> Omar.
>
> oszohni@ncsu.edu
>
>
>
>
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