Hi,

Have a look at the following reference:

"Corner compensation techniques in anisotropic etching of 100-silicon using
aqueous KOH", Sandmaier, H.; Offereins, H.L.; Kuhl, K. & Lang, W., IEEE,
1991, pp. 456-459.

These authors have a few papers on corner compensation so do a literature
search and you should be able to track down some more useful papers. You can
download the above article on IEEE Xplore.

Regards,

Michael Larsson


>From: "Nibras Sahib Awaja" 
>Reply-To: General MEMS discussion 
>To: mems-talk@memsnet.org
>CC: mems-talk@memsnet.org
>Subject: [mems-talk] corner compensation structure for 100 Si in KOH
>Date: Mon, 21 Jun 2004 10:53:25 +1000
>
>Dear all,
>I am trying to add a compensation structure to the convex corner of <100>Si
>spring and etch it in KOH+water. Could you please advice me about how can I
>choose the right dimension of these structure.
>Cheers,
>Nibras
>
>-----Original Message-----
>From: mems-talk-request@memsnet.org
>To: mems-talk@memsnet.org
>Date: Mon, 21 Jun 2004 02:00:51 +1000 (EST)
>Subject: MEMS-talk Digest, Vol 20, Issue 22
>
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