Bob,
    Good to see you are still active on the web.  You are right about the
addition of CF4 one of our customers is using 30% CF4, 70% O2, running hot near
270 degrees C and removing 8 microns of hard baked Polymide in 4 minutes.  Bill
Moffat

-----Original Message-----
From: BobHendu@aol.com [mailto:BobHendu@aol.com]
Sent: Tuesday, June 29, 2004 7:59 AM
To: General MEMS discussion
Subject: Re: [mems-talk] polyimide etching


Try adding some CF4 to you oxygen. This will help to remove some of the filler
material which is contained in Polyimides. It doesn't always give a clean etch
but it works for most imides. Bob Henderson
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