Hi, Zou,

Geogergtown University group said 75% CF4 and 25% O2 gave the highest etch rate.


J. Garra, T. Long, J. Currie, T. Schneider & R. White, M. Paranjape; J. Vac.
Sci. Technol. A vol. 20, no. 3, May/ June, pp 975-982. (2002)

Good luck!

Lydia


Quoting junzou@uiuc.edu:

> Hi,
>
> We want to blanket-etch a thin PDMS layer (1~2um thick) with
> CF4/O2 plasma.  Can anyone suggest a suitable gas mixture,
> power, pressure and also the associated etch rate?
>
> Thanks a lot!
>
> Jun
>
> *******************************************
> Jun Zou
> 319B Micro and Nanotechnology Lab
> University of Illinois at Urbana-Chamapaign
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