I don't know about e-beam resists, but with UV resist you can do a UV cure - 1 hour under 248 nm light with a high temperature bake - which crosslinks the resist and makes it insoluble. Shipley should have a white paper on the process. Getting the resist off afterwards can be a trick, we've used a very long O2 plasma. Our resist was thicker than you are using - between ..75 and 1.5 microns. I forget the number, but it was one of shipey's standard UV resists. David Nemeth Senior Engineer Sophia Wireless, Inc. 14225-C Sullyfield Circle Chantilly, VA Ph: (703) 961-9573 x206 Fax:(703) 961-9576 -----Original Message----- From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]On Behalf Of olivier boulle Sent: Saturday, July 03, 2004 10:23 AM To: mems-talk@memsnet.org Subject: [mems-talk] resist resistant to solvent Dear Colleagues, I am looking for a thin resist (300nm), resistant to acetone and trichloroethylene, that can be easily etched with O2 plasma. I plan to use it in a bilayer configuration PMMA/resist. I will transfer patterns defined by e-beam lithography by etching the resist with O2 plasma. All the process must be made at low temperature (T<140°C). I already tried Su 8, but it was too rough after O2 plasma for my process. Does anyone ever heard about such a resist? I would be very pleased for any suggestion, Thanks a lot, Olivier Boulle _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/