Hello all,
Now i am doing KOH etching of silicon wafer. But frequently found lots of
particls on sample surface after etching, which make it difficult to get good
afm images. I usually do the standard clean before and after the etching. I am
not sure whether it is caused by the contamination in KOH solution or I need
to do other cleaning process. Can anybody give me suggestions? thanks.


Regards,
Yilei Zhang